The commercial 3D animation package Maya can be adapted to function as a very powerful fashion design tool. Using the MIThril 2003 Integrated Design Concept as an example, my research has focused on a handful of techniques.
First, I have been investigating UV mapping as a way to create garment patterns suitable for cutting. Using a polygon object of any complexity as the base garment, a custom UV map is created which "unwraps" the polygon (often in creative ways). This mapping can be customized to account for preferred seam locations, number of pattern pieces, etc. Unfortunately Maya still does not understand the concept of a seam allowance, ease, darts, or any number of standard garment constructs. Once I have a less-buggy version working I hope to post the MEL script here for others to try out. Below shows three stages of the mapping process: 1. the finished garment 2. wireframe view of the garment converted to a polygon 3. UV mapping, showing all pattern pieces.
Another technique I am working on involves using dynamic weight and force calculations to check the fit of a modeled garment. This is especially useful for Wearables researchers, as the comfort impact of any devices embedded in clothing needs to be minimal.
I have created a number of sample garments in Maya to illustrate innovative pattern ideas or computer-generated complexity. They can be viewed in the PDF portfolio below:
ben_maron_fashion.pdf (1.7 MB)
